Published in
International Conference on Extreme Ultraviolet Lithography 2018, 2018
DOI: 10.1117/12.2502879
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Holographic masks for computational proximity lithography with EUV radiation
Proceedings article published in 2018 by
S. Danylyuk,
Valerie Deuter,
Maciej Grochowicz,
Jan Biller,
Sascha Brose,
Thomas Taubner 
,
Detlev Grützmacher,
Larissa Juschkin
,
Detlev Grützmacher,
Larissa Juschkin
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving forbidden
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