Published in
IOP Publishing, Japanese Journal of Applied Physics, 10(57), p. 101101, 2018
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Comprehensive investigation of the interfacial charges and dipole in GeO x /Al2O3 gate stacks of Ge MOS capacitor by postdeposition annealing
Journal article published in 2018 by
Lixing Zhou,
Xiaolei Wang,
Xueli Ma,
Kai Han,
Yanrong Wang,
Jinjuan Xiang,
Hong Yang,
Jing Zhang,
Chao Zhao,
Tianchun Ye 
,
Wenwu Wang
,
Wenwu Wang
This paper is made freely available by the publisher.
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