Published in
American Institute of Physics, Journal of Applied Physics, 14(122), p. 144105
DOI: 10.1063/1.4989908
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Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage
Journal article published in 2017 by
Faizan Ali,
Xiaohua Liu,
Dayu Zhou,
Xirui Yang,
Jin Xu,
Tony Schenk 
,
Johannes Müller,
Uwe Schroeder ,
Fei Cao,
Xianlin Dong
,
Johannes Müller,
Uwe Schroeder ,
Fei Cao,
Xianlin Dong
This paper was not found in any repository, but could be made available legally by the author.
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