Published in
American Institute of Physics, Journal of Applied Physics, 11(124), p. 115302
DOI: 10.1063/1.5038746
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Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
Journal article published in 2018 by
Ufuk Kılıç,
Ufuk Kilic 
,
Shah Valloppilly,
Derek Sekora,
Alyssa Mock ,
Rafał Korlacki,
Elena M. Echeverria,
Elena M. Echeverría ,
Natale Ianno,
Eva Franke-Schubert,
Eva Schubert,
Mathias M. Schubert,
Mathias Schubert
,
Shah Valloppilly,
Derek Sekora,
Alyssa Mock ,
Rafał Korlacki,
Elena M. Echeverria,
Elena M. Echeverría ,
Natale Ianno,
Eva Franke-Schubert,
Eva Schubert,
Mathias M. Schubert,
Mathias Schubert
This paper was not found in any repository, but could be made available legally by the author.
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