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Elsevier, Applied Surface Science, (414), p. 224-229

DOI: 10.1016/j.apsusc.2017.04.060

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Effects of plasma treatment time on surface characteristics of indium-tin-oxide film for resistive switching storage applications

Journal article published in 2017 by Po-Hsun Chen ORCID, Ting-Chang Chang ORCID, Kuan-Chang Chang, Tsung-Ming Tsai, Chih-Hung Pan, Chih-Cheng Shih, Cheng-Hsien Wu, Chih-Cheng Yang, Wen-Chung Chen, Jiun-Chiu Lin, Ming-Hui Wang, Hao-Xuan Zheng, Min-Chen Chen, Simon M. Sze
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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