Published in
Elsevier, Microelectronic Engineering, (178), p. 154-157
DOI: 10.1016/j.mee.2017.05.037
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Ultra-high thermal stability and extremely low D on HfO2/p-GaAs(001) interface
Journal article published in 2017 by
H. W. Wan,
Y. H. Lin 
,
K. Y. Lin,
T. W. Chang,
R. F. Cai,
J. Kwo,
M. Hong
,
K. Y. Lin,
T. W. Chang,
R. F. Cai,
J. Kwo,
M. Hong
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