Elemental diffusion study of Ge/Al2O3 and Ge/AlN/Al2O3 interfaces upon post deposition annealing
Journal article published in 2017 by
Yunna Zhu,
Xinglu Wang,
Chen Liu,
Tao Wang,
Hongyan Chen,
Wei-Hua Wang,
Yahui Cheng 
,
Weichao Wang ,
Jiaou Wang,
Shengkai Wang,
Kyeongjae Cho,
Hui Liu,
Hongliang Lu,
Hong Dong
,
Weichao Wang ,
Jiaou Wang,
Shengkai Wang,
Kyeongjae Cho,
Hui Liu,
Hongliang Lu,
Hong Dong
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