Published in
Elsevier, Applied Surface Science, (433), p. 51-59
DOI: 10.1016/j.apsusc.2017.10.072
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Evolution of resistive switching mechanism through H 2 O 2 sensing by using TaO x -based material in W/Al 2 O 3 /TaO x /TiN structure
Journal article published in 2018 by
Somsubhra Chakrabarti,
Rajeswar Panja,
Sourav Roy,
Anisha Roy,
Subhranu Samanta,
Mrinmoy Dutta,
Sreekanth Ginnaram,
Siddheswar Maikap,
Hsin-Ming Cheng,
Ling-Na Tsai,
Ya-Ling Chang,
Rajat Mahapatra,
Debanjan Jana,
Jian-Tai Qiu 
,
Jer-Ren Yang
,
Jer-Ren Yang
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