Published in
Elsevier, Microelectronic Engineering, (191), p. 25-31
DOI: 10.1016/j.mee.2018.01.018
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Beyond 100 nm resolution in 3D laser lithography — Post processing solutions
Journal article published in 2018 by
G. Seniutinas 
,
A. Weber,
C. Padeste,
I. Sakellari,
M. Farsari,
C. David
,
A. Weber,
C. Padeste,
I. Sakellari,
M. Farsari,
C. David
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