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The Electrochemical Society, ECS Journal of Solid State Science and Technology, 9(7), p. P473-P479

DOI: 10.1149/2.0161809jss

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Impact of Some Processing Steps onto the Strain Distributions in FD-SOI CMOS Planar Devices: A Contribution of Dark-Field Electron Holography

Journal article published in 2018 by V. Boureau, D. Benoit, A. Claverie ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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