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Elsevier, Microelectronic Engineering, (195), p. 74-85

DOI: 10.1016/j.mee.2018.04.005

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Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities

Journal article published in 2018 by Cian Cummins ORCID, Michael A. Morris ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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