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Institute of Electrical and Electronics Engineers, IEEE Transactions on Electron Devices, 8(65), p. 3229-3236, 2018

DOI: 10.1109/ted.2018.2849872

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Improved Switching Stability and the Effect of an Internal Series Resistor in HfO<sub>2</sub>/TiO<sub>&lt;italic&gt;x&lt;/italic&gt;</sub> Bilayer ReRAM Cells

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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