Published in
American Institute of Physics, Journal of Applied Physics, 18(121), p. 185707
DOI: 10.1063/1.4983300
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Metal-organic chemical vapor deposition of high quality, high indium composition N-polar InGaN layers for tunnel devices
Journal article published in 2017 by
Cory Lund 
,
Brian Romanczyk ,
Massimo Catalano,
Qingxiao Wang,
Wenjun Li,
Domenic DiGiovanni,
Moon J. Kim,
Patrick Fay ,
Shuji Nakamura,
Steven P. DenBaars ,
Umesh K. Mishra,
Stacia Keller
,
Brian Romanczyk ,
Massimo Catalano,
Qingxiao Wang,
Wenjun Li,
Domenic DiGiovanni,
Moon J. Kim,
Patrick Fay ,
Shuji Nakamura,
Steven P. DenBaars ,
Umesh K. Mishra,
Stacia Keller
This paper was not found in any repository, but could be made available legally by the author.
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