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Wiley, physica status solidi (a) – applications and materials science, 9(215), p. 1700638

DOI: 10.1002/pssa.201700638

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Impact of AlN/Si Nucleation Layers Grown Either by NH3 -MBE or MOCVD on the Properties of AlGaN/GaN HFETs

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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