Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 5(36), p. 05G505, 2018
DOI: 10.1116/1.5035333
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Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication
Journal article published in 2018 by
Javier Arias-Zapata,
Djawhar Ferrah 
,
Hasan-Al Mehedi,
Gilles Cunge,
Marc Zelsmann
,
Hasan-Al Mehedi,
Gilles Cunge,
Marc Zelsmann
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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