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American Institute of Physics, Applied Physics Letters, 20(110), p. 201110

DOI: 10.1063/1.4983198

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Reconfigurable phase-change photomask for grayscale photolithography

Journal article published in 2017 by Q. Wang ORCID, G. H. Yuan, K. S. Kiang ORCID, K. Sun, B. Gholipour, E. T. F. Rogers, Kun Huang ORCID, N. I. Zheludev, S. S. Ang, J. H. Teng
This paper is available in a repository.
This paper is available in a repository.

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