Published in
American Institute of Physics, Journal of Applied Physics, 4(122), p. 044503
DOI: 10.1063/1.4995278
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A multifunctional plasma and deposition sensor for the characterization of plasma sources for film deposition and etching
Journal article published in 2017 by
Michael Weise,
Stefan Seeger,
Karsten Harbauer 
,
Thomas Welzel,
Klaus Ellmer
,
Thomas Welzel,
Klaus Ellmer
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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