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American Chemical Society, Chemistry of Materials, 19(28), p. 7158-7166, 2016

DOI: 10.1021/acs.chemmater.6b03704

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Atomic Layer Deposition of GeTe Films Using Ge{N[Si(CH3)3]2}2, {(CH3)3Si}2Te, and Methanol

Journal article published in 2016 by Taehong Gwon, Taeyong Eom, Sijung Yoo, Han-Koo Lee, Deok-Yong Cho, Moo-Sung Kim, Iain Buchanan, Manchao Xiao, Sergei Ivanov, Cheol Seong Hwang
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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