Published in
American Institute of Physics, Applied Physics Letters, 5(100), p. 051601
DOI: 10.1063/1.3681382
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Functional plasma polymers deposited in capacitively and inductively coupled plasmas
,
Enrico Körner,
Shang Chen,
Jan Benedikt ,
Achim von Keudell
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Abstract
Capacitively and inductively coupled plasmas were investigated in order to deposit functional plasma polymers. Considering plasma chemical and surface processes, comparable films can be obtained with both plasma sources yielding distinctly higher deposition rates for ICP. While the gas phase processes scaled with the energy input into the plasma, the surface processes were controlled by the energy dissipated during film growth (ion bombardment). (C) 2012 American Institute of Physics. [doi: 10.1063/1.3681382]