Published in
American Institute of Physics, Journal of Applied Physics, 15(119), p. 155303
DOI: 10.1063/1.4946841
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Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization
Journal article published in 2016 by
M. D. Tucker,
R. Ganesan,
Dg G. McCulloch,
Jg G. Partridge,
M. Stueber,
S. Ulrich,
Mmm M. M. Bilek 
,
Dr R. McKenzie ,
Na A. Marks
,
Dr R. McKenzie ,
Na A. Marks
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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