Published in
Springer Verlag, Plasma Chemistry and Plasma Processing, 4(38), p. 655-656
DOI: 10.1007/s11090-018-9906-2
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Special Issue: Papers by Invited Lecturers at the 23rd International Symposium on Plasma Chemistry (ISPC 23)
Journal article published in 2018 by
Sylvain Coulombe 
,
Luc Stafford
,
Luc Stafford
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