Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 1(35), p. 01B130
DOI: 10.1116/1.4972210
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Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
Journal article published in 2017 by
Akhil Sharma,
Valentino Longo,
Marcel A. Verheijen,
Ageeth A. Bol 
,
W. M. M. (Erwin) Kessels
,
W. M. M. (Erwin) Kessels
This paper is available in a repository.
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