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American Chemical Society, ACS Applied Materials and Interfaces, 1(9), p. 537-547, 2016

DOI: 10.1021/acsami.6b11613

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Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O

Journal article published in 2016 by Seul Ji Song, Taehyung Park, Kyung Jean Yoon, Jung Ho Yoon, Dae Eun Kwon, Wontae Noh, Clement Lansalot-Matras, Satoko Gatineau, Han-Koo Lee, Sanjeev Gautam ORCID, Deok-Yong Cho ORCID, Sang Woon Lee ORCID, Cheol Seong Hwang ORCID
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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