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American Institute of Physics, Journal of Vacuum Science and Technology B, 4(34), p. 041603

DOI: 10.1116/1.4948916

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Novel germanium surface modification for sub-10 nm patterning with electron beam lithography and hydrogen silsesquioxane resist

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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