Published in
American Institute of Physics, Applied Physics Letters, 14(108), p. 143504
DOI: 10.1063/1.4945727
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Memristor and selector devices fabricated from HfO2−xNx
Journal article published in 2016 by
Bj J. Murdoch,
Dg G. McCulloch,
R. Ganesan 
,
Dr R. McKenzie ,
Mmm M. M. Bilek ,
Jg G. Partridge
,
Dr R. McKenzie ,
Mmm M. M. Bilek ,
Jg G. Partridge
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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