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Electrical Transport characterization of nano CMOS devices with ultra-thin silicon film.
UploadModeling and experiments on diffusion and activation of phosphorus in germanium
Download from hal.archives-ouvertes.frSplitting kinetics of Si0.8Ge0.2 layers implanted with H or sequentially with He and H
Download from hal.archives-ouvertes.frImaging Si nanoparticles embedded in SiO2 layers by (S)TEM-EELS
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