338 papers found
Refreshing results…
An alternative explanation for the effect of Ge content on the density of end-of-range defects found in ion implanted relaxed SiGe alloys
Experiments and simulation of the diffusion and activation of the n-type dopants P, As, and Sb implanted into germanium
Ynthesis and packaging of nanocrystals by ultra low energy ion implantation for applications in electronics, optics and plasmonics
New organometallic salts as precursors for the functionalization of carbon nanotubes with metallic nanoparticles
Synthesis and packaging of nanocrystals by Ultra Low Energy Ion Implantation for applications in electronics, optics and plasmonics
Evaluación en campo de arcos de escarificador rígidos y flexibles ; Field evaluation of rigid and flexible scarifier shanks
Incidencia de la colocación de cuchillas circulares sobre patrones de roturación y energía requerida en escarificadores de arcos rígidos
Technology Computer Aided Design of 65nm SOI MOSFETs through Integrated Process and Device Simulations
Controlled Drive-In and Precipitation of Hydrogen During Plasma Hydrogenation of Silicon Using a Thin Compressively Strained SiGe Layer
Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs
Amorphization, recrystallization and end of range defects in germanium
Honeycomb voids due to ion implantation in germanium
PD-SOI MOSFETs: interface effect on point defects and doping profiles
Comparison of CBED and dark-field holography for strain mapping in nanostructures and devices
Comparison between 65nm bulk and PD-SOI MOSFETs: Si/BOX interface effect on point defects and doping profiles
Drift-diffusion and Ballistic Mobility Characterization in Nano CMOS Devices
On the influence of elastic strain on the accommodation of carbon atoms into substitutional sites in strained Si:C layers grown on Si substrates
Strain measurements in electronic devices by aberration-corrected HRTEM and dark-field holography
Spallation generated by femtosecond laser driven shocks in thin metallic targets
Selective growth of tensily strained Si1−yCy films on patterned Si substrates
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