Shoichiro Imanishi - Dissemin

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All papers authored by Shoichiro Imanishi

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2022 Benjian Liu

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, Te Bi

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, Yu Fu

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, Shoichiro Imanishi

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, Kang Liu, Bing Dai

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, Hiroshi Kawarada

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MOSFETs on (110) C–H Diamond: ALD Al₂O₃/Diamond Interface Analysis and High Performance Normally-OFF Operation Realization

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2021 Ken Kudara

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, Shoichiro Imanishi

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, Atsushi Hiraiwa

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, Yuji Komatsuzaki, Yutaro Yamaguchi, Yoshifumi Kawamura, Shintaro Shinjo, Hiroshi Kawarada

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High Output Power Density of 2DHG Diamond MOSFETs With Thick ALD-Al₂O₃

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2020 Wenxi Fei

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, Te Bi, Masayuki Iwataki, Shoichiro Imanishi

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, Hiroshi Kawarada

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Publisher's Note: “Oxidized Si terminated diamond and its MOSFET operation with SiO2 gate insulator” [Appl. Phys. Lett. 116, 212103 (2020)]

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This paper was not found in any repository, but could be made available legally by the author.

Wenxi Fei

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, Te Bi, Masayuki Iwataki, Shoichiro Imanishi

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, Hiroshi Kawarada

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Oxidized Si terminated diamond and its MOSFET operation with SiO2 gate insulator

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This paper was not found in any repository, but could be made available legally by the author.

Shoichiro Imanishi

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, Ken Kudara, Hitoshi Ishiwata

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, Kiyotaka Horikawa, Shotaro Amano, Masayuki Iwataki

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, Aoi Morishita, Atsushi Hiraiwa

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, Hiroshi Kawarada

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Drain Current Density Over 1.1 A/mm in 2D Hole Gas Diamond MOSFETs with Regrown p++-Diamond Ohmic Contacts

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This paper was not found in any repository, but could be made available legally by the author.

2019 Shoichiro Imanishi

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, Kiyotaka Horikawa, Nobutaka Oi, Satoshi Okubo, Taisuke Kageura, Atsushi Hiraiwa, Hiroshi Kawarada

3.8 W/mm RF Power Density for ALD Al2O3-Based Two-Dimensional Hole Gas Diamond MOSFET Operating at Saturation Velocity

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