Papers authored by Maxime Darnon
Refreshing results…
2012
O. Joubert,
M. Darnon 
,
G. Cunge,
E. Pargon,
T. David,
D. Thibault,
C. Petit-Etienne,
L. Vallier,
N. Posseme,
P. Bodart,
L. Azarnouche,
R. Blanc,
M. Haas,
M. Brihoum,
S. Banna
and 1 other authors
,
G. Cunge,
E. Pargon,
T. David,
D. Thibault,
C. Petit-Etienne,
L. Vallier,
N. Posseme,
P. Bodart,
L. Azarnouche,
R. Blanc,
M. Haas,
M. Brihoum,
S. Banna
and 1 other authors
Towards new plasma technologies for 22nm gate etch processes and beyond
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Willi Volksen,
Sampath Purushothaman,
Maxime Darnon ,
M. F. Lofaro,
S. A. Cohen,
Mike F. Lofaro,
J. P. Doyle,
James P. Doyle,
Nicholas Fuller,
Philip M. Rice,
T. P. Magbitang,
Teddie P. Magbitang,
P. M. Rice,
L. E. Krupp,
Leslie E. Krupp
and 5 other authors
,
M. F. Lofaro,
S. A. Cohen,
Mike F. Lofaro,
J. P. Doyle,
James P. Doyle,
Nicholas Fuller,
Philip M. Rice,
T. P. Magbitang,
Teddie P. Magbitang,
P. M. Rice,
L. E. Krupp,
Leslie E. Krupp
and 5 other authors
Integration of a manufacturing grade, k = 2.0 spin-on material in a single damascene structure
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Nicolas Possémé,
Thibaut David,
Thierry Chevolleau,
Maxime Darnon ,
Philippe-H. Brun,
Marc Guillermet,
Jean Pierre Oddou,
Sebastien Barnola,
Fanny Bailly,
Regis Bouyssou,
Julien Ducote,
Romain Hurand,
Christophe Vérove,
Olivier Joubert
,
Philippe-H. Brun,
Marc Guillermet,
Jean Pierre Oddou,
Sebastien Barnola,
Fanny Bailly,
Regis Bouyssou,
Julien Ducote,
Romain Hurand,
Christophe Vérove,
Olivier Joubert
Porous SiOCH integration: Etch challenges with a trench first metal hard mask approach
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Christophe Licitra,
Thierry Chevolleau,
Regis Bouyssou,
Mohamed El Kodadi,
Georg Haberfehlner,
Jerome Hazart,
Leopold Virot,
Maxime Besacier,
Nicolas Posseme,
Maxime Darnon ,
Romain Hurand,
Patrick Schiavone,
Francois Bertin
Download from iopscience.iop.org
,
Romain Hurand,
Patrick Schiavone,
Francois Bertin
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C. Petit-Etienne,
M. Darnon ,
L. Vallier,
E. Pargon,
G. Cunge,
M. Fouchier,
P. Bodart,
M. Haass,
M. Brihoum,
O. Joubert,
S. Banna,
T. Lill
,
L. Vallier,
E. Pargon,
G. Cunge,
M. Fouchier,
P. Bodart,
M. Haass,
M. Brihoum,
O. Joubert,
S. Banna,
T. Lill
Etching mechanisms of thin SiO2 exposed to Cl2 plasma
Download from www.researchgate.net
Maxime Darnon ,
Camille Petit-Etienne,
Erwine Pargon,
Gilles Cunge,
Laurent Vallier,
Paul Bodart,
Moritz Haas,
M. Haass,
Samer Banna,
Thorsten Lill,
Olivier Joubert
,
Camille Petit-Etienne,
Erwine Pargon,
Gilles Cunge,
Laurent Vallier,
Paul Bodart,
Moritz Haas,
M. Haass,
Samer Banna,
Thorsten Lill,
Olivier Joubert
Synchronous Pulsed Plasma for Silicon Etch Applications
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F. Bailly,
T. David,
T. Chevolleau,
M. Darnon ,
N. Posseme,
R. Bouyssou,
J. Ducote,
O. Joubert,
Christophe Cardinaud,
C. Cardineau
,
N. Posseme,
R. Bouyssou,
J. Ducote,
O. Joubert,
Christophe Cardinaud,
C. Cardineau
Roughening of porous SiCOH materials in fluorocarbon plasmas
Download from www.researchgate.net
2009
M. Guillorna,
M. Darnon ,
J. Ott,
C. Lavoie,
M. Frank,
L. Gignac,
J. Chang,
J. Newbury,
C. Wang,
D. Klaus,
E. Kratschmer,
J. Bucchignano,
B. To,
A. Pyzyna,
W. Graham
and 13 other authors
,
J. Ott,
C. Lavoie,
M. Frank,
L. Gignac,
J. Chang,
J. Newbury,
C. Wang,
D. Klaus,
E. Kratschmer,
J. Bucchignano,
B. To,
A. Pyzyna,
W. Graham
and 13 other authors
Trigate 6T SRAM scaling to 0.06 µm2
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