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Deep germanium etching using time multiplexed plasma etching
Download from savoirs.usherbrooke.caModification of porous SiOCH by first contact with water vapor after plasma process
Download from www.researchgate.netInductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry
Download from www.researchgate.netToward Successful Integration of Porous Low-k Materials: Strategies Addressing Plasma Damage
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