Published in
Springer Verlag, Journal of Materials Science, 9(52), p. 4878-4885
DOI: 10.1007/s10853-016-0722-x
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Relationship between nano-architectured Ti1−x Cu x thin film and electrical resistivity for resistance temperature detectors
Journal article published in 2016 by
A. Ferreira 
,
J. Borges,
C. Lopes ,
M. S. Rodrigues ,
S. Lanceros-Mendez,
F. Vaz
,
J. Borges,
C. Lopes ,
M. S. Rodrigues ,
S. Lanceros-Mendez,
F. Vaz
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