Published in
Society of Photo-optical Instrumentation Engineers, Proceedings of SPIE, 2014
DOI: 10.1117/12.2045754
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An insitu hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate
Proceedings article published in 2014 by
Tandra Ghoshal,
Ramsankar Senthamaraikannan,
Matthew T. Shaw,
Justin D. Holmes,
Michael A. Morris
This paper was not found in any repository, but could be made available legally by the author.
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