Published in
Springer Verlag, Journal of the Korean Physical Society, 4(68), p. 557-562
DOI: 10.3938/jkps.68.557
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Effect of argon gas pressure on residual stress, microstructure evolution and electrical resistivity of beryllium films
Journal article published in 2016 by
Bing-Chi Luo,
Kai Li,
Ji-Qiang Zhang,
Jiang-Shan Luo,
Wei-Dong Wu,
Yong-Jian Tang
This paper was not found in any repository, but could be made available legally by the author.
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