Published in
American Institute of Physics, Journal of Vacuum Science and Technology B, 6(33), p. 060605, 2015
DOI: 10.1116/1.4936112
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Deep germanium etching using time multiplexed plasma etching
Journal article published in 2015 by
Maxime Darnon 
,
Mathieu de Lafontaine,
Maïté Volatier,
Simon Fafard,
Richard Arès,
Abdelatif Jaouad,
Vincent Aimez
,
Mathieu de Lafontaine,
Maïté Volatier,
Simon Fafard,
Richard Arès,
Abdelatif Jaouad,
Vincent Aimez
This paper is available in a repository.
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