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Wiley-VCH Verlag, Chemical Vapor Deposition, 4(5), p. 179-184, 1999

DOI: 10.1002/(sici)1521-3862(199908)5:4<179::aid-cvde179>3.0.co;2-6

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First Approach to an AlSb Layer from the Single-Source Precursors [Et2AlSb(SiMe3)2]2 and (iBu2AlSb(SiMe3)2]2

Journal article published in 1999 by Hyung S. Park, Stephan Schulz, Helge Wessel, Herbert W. Roesky
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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