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Wiley, physica status solidi (a) – applications and materials science, 2(213), p. 265-269

DOI: 10.1002/pssa.201532416

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Electron energy distribution in Si/TiN and Si/Ru hybrid floating gates with hafnium oxide based insulators for charge trapping memory devices

Journal article published in 2016 by F. Cerbu, D. V. Andreev, J. Lisoni, L. Breuil, V. V. Afanas'ev, A. Stesmans, M. Houssa ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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