Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 1(31), p. 01A135
DOI: 10.1116/1.4769793
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Atomic layer deposition of Al2O3 and AlxTi1−xOy thin films on N2O plasma pretreated carbon materials
Journal article published in 2012 by
Andrey M. Markeev 
,
Anna G. Chernikova,
Anastasya A. Chouprik ,
Sergey A. Zaitsev,
Dmitry V. Ovchinnikov ,
Holger Althues,
Susanne Dörfler
,
Anna G. Chernikova,
Anastasya A. Chouprik ,
Sergey A. Zaitsev,
Dmitry V. Ovchinnikov ,
Holger Althues,
Susanne Dörfler
This paper was not found in any repository, but could be made available legally by the author.
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