Published in

Elsevier, Applied Surface Science, 23(258), p. 9208-9212

DOI: 10.1016/j.apsusc.2011.07.074

Links

Tools

Export citation

Search in Google Scholar

Nanoscale concentration and strain distribution in pseudomorphic films Si1−xGex/Si processed by pulsed laser induced epitaxy

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

Full text: Unavailable

Green circle
Preprint: archiving allowed
Red circle
Postprint: archiving forbidden
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO