Published in
American Institute of Physics, Applied Physics Letters, 1(105), p. 011602, 2014
DOI: 10.1063/1.4887056
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In situ x-ray photoelectron spectroscopy and capacitance voltage characterization of plasma treatments for Al2O3/AlGaN/GaN stacks
Journal article published in 2014 by
Xiaoye Qin,
Antonio Lucero,
Angelica Azcatl,
Jiyoung Kim,
Robert M. Wallace 
This paper was not found in any repository, but could be made available legally by the author.
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