Published in
American Institute of Physics, Journal of Vacuum Science and Technology B, 1(31), p. 011207
DOI: 10.1116/1.4770505
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Impact of low-k structure and porosity on etch processes
Journal article published in 2013 by
Maxime Darnon 
,
Nicolas Casiez,
Thierry Chevolleau,
Geraud Dubois,
Willi Volksen,
Théo J. Frot,
T. J. Frot,
Romain Hurand,
Thibaut L. David,
T. L. David,
Nicolas Posseme,
Névine Rochat,
Christophe Licitra
,
Nicolas Casiez,
Thierry Chevolleau,
Geraud Dubois,
Willi Volksen,
Théo J. Frot,
T. J. Frot,
Romain Hurand,
Thibaut L. David,
T. L. David,
Nicolas Posseme,
Névine Rochat,
Christophe Licitra
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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