Published in
Optica, Optics Express, 6(15), p. 3465, 2007
DOI: 10.1364/oe.15.003465
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Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
Journal article published in 2007 by
P. W. Wachulak 
,
M. G. Capeluto,
M. C. Marconi,
C. S. Menoni,
J. J. Rocca
,
M. G. Capeluto,
M. C. Marconi,
C. S. Menoni,
J. J. Rocca
This paper is made freely available by the publisher.
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Abstract
Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.