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The 17th Annual SEMI/IEEE ASMC 2006 Conference
DOI: 10.1109/asmc.2006.1638736
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Holistic Cycle Time Analysis and Improvement Project within a 200mm Lithography I-line Production Area
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Abstract
In this paper, a holistic approach for analyzing and improving a work center's performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared