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Published in

Optica, Optics Express, 21(16), p. 16877, 2008

DOI: 10.1364/oe.16.016877

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Si lattice parameter measurement by centimeter X-ray interferometry

Journal article published in 2008 by Luca Ferroglio, Giovanni Mana ORCID, Enrico Massa
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

A combined X-ray and optical interferometer capable of centimeter displacements has been made to measure the lattice parameter of Si crystals to within a 3 x 10(-9) relative uncertainty. This paper relates the results of test measurements carried out to assess the capabilities of the apparatus.