An astonishing λ/20 height control is accomplished in 2.5D photopolymerized structures by taking advantage of the induced expansion of the resin. Our nanofabrication method is a one-pot approach with two processing steps: (i) regular 2.5D photopolymerization of the resin monomer by using multiphoton direct laser writing (DLW) lithography and (ii) spatially-selective irradiation of the photopolymerized features before development resulting in a nanometer-controlled height increase of the structure. The UV-visible-NIR sub-wavelength axial feature size (~40 nm) of this method allows fabricating devices with applications in multiple technological fields such as nanoelectronics and photonics.