Published in

Elsevier, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1-2(242), p. 387-389, 2006

DOI: 10.1016/j.nimb.2005.08.128

Links

Tools

Export citation

Search in Google Scholar

Proton beam lithography at the University of Surrey's Ion Beam Centre

This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

Investigations into the lithography applications using MeV protons and alpha-particles are being performed at the Ion Beam Centre of the University of Surrey, UK. This is a new application of the microbeam in this laboratory. Proton beam lithography has been carried out on several materials: The first microstructures were made on bulk polymers, to test the performance of our beam. Photosensitive glasses have also been micropatterned with successful results and more recently, proton lithography of semiconductor materials has been introduced. In this paper we present a few structures made in GaAs and PMMA. (c) 2005 Elsevier B.V. All rights reserved.