Published in
Royal Society of Chemistry, Nanoscale, 39(14), p. 14529-14536, 2022
DOI: 10.1039/d2nr03696g
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Machine learning enhanced in situ electron beam lithography of photonic nanostructures
Journal article published in 2022 by
Jan Donges,
Marvin Schlischka,
Ching-Wen Shih 
,
Monica Pengerla,
Imad Limame,
Johannes Schall,
Lucas Bremer,
Sven Rodt,
Stephan Reitzenstein
,
Monica Pengerla,
Imad Limame,
Johannes Schall,
Lucas Bremer,
Sven Rodt,
Stephan Reitzenstein
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Abstract
Machine learning is used to improve in situ electron beam lithography capabilities. Specially trained algorithms increase the sensitivity by more than a factor of 10 in the deterministic processing of high-performance quantum light sources.