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American Chemical Society, ACS Applied Nano Materials, 3(4), p. 2558-2564, 2021

DOI: 10.1021/acsanm.0c03203

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Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings

Journal article published in 2021 by Su Min Hwang ORCID, Harrison Sejoon Kim ORCID, Dan N. Le, Arul Vigneswar Ravichandran, Akshay Sahota, Jaebeom Lee ORCID, Yong Chan Jung, Si Joon Kim ORCID, Jinho Ahn, Byung Keun Hwang, Lance Lee, Xiaobing Zhou ORCID, Jiyoung Kim ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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