Sub-nm depth characterization of EUV nanoscale photoresist films by standing-wave photoemission spectroscopy
Proceedings article published in 2020 by
Giuseppina Conti,
Henrique Perin Martins 
,
Isvar A. Cordova,
Jonathan Ma,
Rudy J. Wojtecki,
Patrick P. Naulleau,
Slavomir Nemsak
,
Isvar A. Cordova,
Jonathan Ma,
Rudy J. Wojtecki,
Patrick P. Naulleau,
Slavomir Nemsak
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving forbidden
Data provided by 