Cian Cummins
0000-0001-6338-3991
Trinity College Dublin
34 papers found
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Nanoporous membrane production via block copolymer lithography for high heat dissipation systems
Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application
Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing
Parallel Arrays of Sub-10 nm Aligned Germanium Nanofins from an In Situ Metal Oxide Hardmask using Directed Self-Assembly of Block Copolymers
Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography
Nanoscale neuroelectrode modification via sub-20 nm silicon nanowires through self-assembly of block copolymers
Aligned Silicon Nanofins via the Directed Self-Assembly of PS-b-P4VP Block Copolymer and Metal Oxide Enhanced Pattern Transfer
Study of the Kinetics and Mechanism of Rapid Self-Assembly in Block Copolymer Thin Films during Solvo-Microwave Annealing
Selective Etching of Polylactic Acid in Poly(styrene)-Block-Poly(D,L)Lactide Diblock Copolymer for Nanoscale Patterning
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process
Erratum: The following articles belong to this special issue on polymers for microelectronics and appear (Journal of Applied Polymer Science (2014) 131:18)
Surface Modification of Absorbable Magnesium Stents by Reactive Ion Etching
Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: Fabrication of inorganic nanostructured etchmask for lithographic use
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