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Elsevier, Surface and Coatings Technology, (326), p. 281-290, 2017

DOI: 10.1016/j.surfcoat.2017.07.056

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Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration

Journal article published in 2017 by Mari Napari ORCID, Manu Lahtinen, Alexey Veselov, Jaakko Julin ORCID, Erik Østreng, Timo Sajavaara ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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